S.I.P Pumps are used to create UHV in charges particle accelerators, surface analytical spectrometers, mass spectrometers, R&D institutes, universities etc.
The Triode Sputter Ion Pumps are employed to create hydrocarbon-free ultra high vacuum. They utilize the high intensity cold cathode discharge produced in a magnetic field to sputter a highly reactive metal. The reactive metal layer called getter film combines with the active gas molecules such as hydrogen, nitrogen, oxygen, water vapour etc to form low vapour pressure stable compounds, thus reducing the number of gas molecules and hence gas pressure in the system volume.
These pumps have higher pumping capacity for inert gases compared its predecessor diode sputter ion pumps. These pumps can be mounted on a system in any orientation.