Vacuum System

IN UHV System Utra-High Vacuum is necessary for many surface analytic techniques such as

  • X-ray photoelectrons spectroscopy (XPS)
  • Auger electron spectroscopy (AES)
  • Secondary ion mass spectrometry(SIMS)
  • Thermal deserption spectroscopy (TDP)
  • Thin film growth and preparation techniques with stringent requirements for purity, such as molecular beam epitaxy (MBE), UHV chemical vapor deposition (CVD) and UHV pulsed laser deposition (PLD)
  • Angle resolved photo emission spectroscopy (ARPES)

UHV is necessary for these products to reduce the surface contamination, by reducing the number of molecules reaching the sample over a given time period. At 0.1 mPa (10 Torr), it only takes 1 second to cover a surface with a contaminant, so much low pressures are needed for long experiments.

UHV is required for

  • Particle accelerators
  • Gravitational Wave detectors such as LIGO,VIRGO, GEO 600, and TAMA 300
  • Atomic physics experiments which use cold atoms, such as ion trapping or making Bose - Einstein condensates and, while not compulsory, can prove beneficial in applications such as :
  • Atomic force microscopy. High vacuum enables high Q factors on the cantilever oscillation Scanning tunnelling microscopy. High vacuum reduces oxidation and contamination, hence enables imaging and the achievement of