IN UHV System Utra-High Vacuum is necessary for many surface analytic techniques such as
- X-ray photoelectrons spectroscopy (XPS)
- Auger electron spectroscopy (AES)
- Secondary ion mass spectrometry(SIMS)
- Thermal deserption spectroscopy (TDP)
-
Thin film growth and preparation techniques with stringent requirements for purity, such as molecular beam
epitaxy (MBE), UHV chemical vapor deposition (CVD) and UHV pulsed laser deposition (PLD)
- Angle resolved photo emission spectroscopy (ARPES)
UHV is necessary for these products to reduce the surface contamination, by reducing the number of molecules
reaching the sample over a given time period. At 0.1 mPa (10 Torr), it only takes 1 second to cover a surface with a
contaminant, so much low pressures are needed for long experiments.
UHV is required for
- Particle accelerators
- Gravitational Wave detectors such as LIGO,VIRGO, GEO 600, and TAMA 300
-
Atomic physics experiments which use cold atoms, such as ion trapping or making Bose - Einstein condensates and,
while not compulsory, can prove beneficial in applications such as :
-
Atomic force microscopy. High vacuum enables high Q factors on the cantilever oscillation Scanning tunnelling
microscopy. High vacuum reduces oxidation and contamination, hence enables imaging and the achievement of
